Description
Hot-Filament Chemical Vapor Deposition (CVD) System for the Synthesis of Thin Films and Functional Coatings.
Enables controlled deposition of various materials on different substrates.
Applications:
- Semiconductor and microelectronics manufacturing
- Production of protective coatings (wear-resistant, corrosion-resistant)
- Deposition of thin films for optical devices
- Synthesis of nanomaterials (graphene, carbon nanotubes)
